The New Jersey Institute of Technology's Electronic Theses & Dissertations Project

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Tsybeskov, Leonid - 19 ETDs Online (Report generated on 05/19/2013)

Year	Author	Title
2010	Chang, Han-Yun, PhD	Properties and device applications of silicon and silicon-germanium nanostructures with different dimensions
2008	Chidambaram, Thenappan, MS	Raman scattering in free standing porous Si films
2008	Lee, Eun Kyu, PhD	Optical properties and carrier transport in Si/ Si1-xGex nanostructures
2006	Verdoni, Luigi Pollara, MS	Submicron patterning using laser interference lithography
2005	Sharma, Varun, MS	Optical properties of SiGe nanostructures
2004	Lee, Eun Kyu, MS	Carrier transport in Ge nanowires and one dimensional Si/Ge heterojunctions
2003	Koneru, Lakshmi Susmitha, MS	Transport properties of NC-Si / A-SiO2 superlattices and their applications in non-volatile memory

Year	Author	Title
2011	Rahim, Nilufa, PhD	TiN/HfO2/SiO2/Si gate stacks reliability : Contribution of HfO2 and interfacial SiO2 layer
2009	Lee, Seon Woo, PhD	Electrical and optical properties of carbon nanotube intra-connects and conductive polymers
2009	Li, Ruiqiong, MS	Nano-structured platforms as a spectroscopic tool
2009	O'Malley, Sean M., PhD	Synchrotron radiation-based characterization of GaN- based MQW structures and strongly correlated materials
2008	Wu, Michael Yu-Chi, PhD	Propagation and scattering of beam waves in vegetation using scalar transport theory
2007	Chowdhury, Naser Ahmed, PhD	Reliability Studies of TiN/Hf-Silicate Based Gate Stacks
2007	Matsunaga, Takuya, PhD	Formation of RDX nanoparticles by rapid expansion of supercritical solution : in situ characterization by laser scattering
2007	Srinivasan, Purushorthaman, PhD	Characterization and modeling of low-frequency noise in Hf-based high -kappa dielectrics for future cmos applications
2006	Garg, Reenu, PhD	HfO2 as gate dielectric on Si and Ge substrate
2005	Kundu, Tias, PhD	Study of Si/SiO2 interface passivation and SiO2 reliability on deuterium implanted silicon
2004	Kale, Bageshri, MS	Study of design tradeoffs of DRAM and SRAM memories, using HSPICE computer simulation
2004	Srinivasan, Purushothaman, MS	Si-SiO2 interface behavior in n-MOSFETs with screening potential during high-field injection