| Title: | Three-dimensional magnetic field sensor in IBM 0.18¼m CMOS technology |
| Author: | |
| Document Type: | Thesis |
| Department: | Department of Electrical and Computer Engineering |
| Degree: | Master of Science |
| Major: | Electrical Engineering |
| Advisory Committee: |
Misra, Durgamadhab
Sosnowski, Marek
Hou, Edwin
|
| Thesis Date: | 2012, May |
| Keywords: |
3D magnetic field sensor
Complementary metaloxidesemiconductor
|
| Availability: | Unrestricted |
| Abstract: |
This work presents a compact three-dimensional Magnetic Field Sensor (MFS) designed in standard Complementary Metal-Oxide-Semiconductor (CMOS) technology. A circular Vertical Hall Device (VHD) for horizontal magnetic field detection and a split- drain Horizontal Hall Device (HHD) for the vertical magnetic field detection are integrated to implement the three-dimensional M FS. This merged design has the advantage of smaller area and lower power consumption. The sensitivity of the vertical hall device (ring-shaped magneto-resistor) and the horizontal hall device (Split-Drain Magnetic Field-Effect Transistor (SD-MAGFET)) is estimated as 0.11V/T and 2.88V/T respectively. The vertical direction of the magnetic field detection demonstrates a higher sensitivity. A high gain cascode differential amplifier is integrated with the sensor to further amplify the magnetic signal. |
| Complete Thesis: | njit-etd2012-070 (74 pages ~ 1,519 KB pdf) |
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Created September 7, 2012
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