NJIT eTD: The New Jersey Institute of Technology's electronic Theses & Dissertations
Title:
Raman scattering in free standing porous Si films
Author:
Chidambaram, Thenappan
Document Type:
Thesis
Department:
Department of Electrical and Computer Engineering
Degree:
Master of Science
Major:
Electrical Engineering
Advisory Committee:
Tsybeskov, Leonid
Hanafi, Hussein
Sosnowski, Marek
Thesis Date:
2008, May
Keywords:
Porous silicon
Raman scattering
Availability:
Unrestricted
Abstract:

In this thesis, Raman Scattering of free standing porous silicon on sapphire samples of controllably varying porosity is studied. The free standing, fully crystalline porous silicon films were prepared by electrochemical etching and the porous structure were lifted-off by a procedure based on electro-polishing. During Raman scattering measurements, the samples are exposed to relatively high intensity laser radiation. Free-standing porous Si sample temperature and thermal conductivity are calculated by comparing intensities of Stokes and anti-Stokes Raman peaks. Compared to crystalline Si, we find strong decrease in thermal conductivity accompanied by a change in the phonon spectra. Also, comparing Stokes and anti-Stokes Raman spectra, we find that porous Si is a nano-composite material with a complex morphology and variety of crystallites sizes. The porous silicon layers can be used for thermal isolation and as floating substrates for lattice-mismatched hetero-integration.

Complete Thesis:
njit-etd2008-081 (47 pages ~2,995 KB pdf)
Feedback:
Please complete this Feedback Form to inform us about your experience using this website. It will assist us in better serving your information needs in the future. Thank You!
Created October 7, 2008
To view these documents you will need the Acrobat Reader Plug-in. If you do not have it you can download it free from